1. Advanced Ta-based diffusion barriers for Cu interconnects /
Author: René Hübner.
Library: Center and Library of Islamic Studies in European Languages (Qom)
Subject: Electrodiffusion.,Integrated circuits.,Interconnects (Integrated circuit technology),Electrodiffusion.,Integrated circuits.,Interconnects (Integrated circuit technology),TECHNOLOGY & ENGINEERING-- Electronics-- Circuits-- General.,TECHNOLOGY & ENGINEERING-- Electronics-- Circuits-- Integrated.
Classification :
TK7874
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